Dry film etching/plating photoresist 0.3x2m

6,00 

Category:

Description

Negative working, aqueous processable dry film photoresist
Suitable for pattern plate applications on scrubbed and
unscrubbed electroless copper and most Direct Plate surfaces.
Suitable for print and etch application with acid or alkaline
etching.
Suitable for some gold plating applications.
Suitable for some photochemical machining (chemical milling)
application.
Suitable for tent-and-etch applications

 

Width: 300mm

Thickness: 38um

Minimal order quantity: 2m

Datasheet

 

Additional information

Weight 0,2 kg
Dimensions 200 × 30 × 0,04 cm